Substance
ID:318364
Names and Identifiers
IUPAC Traditional name
dimethyl[tris(dimethylamino)hafnio]amine
Synonyms
TDMAH四(二甲胺基)铪(IV)Tetrakis(dimethylamido)hafnium(IV)Tetrakis(dimethylamino)hafnium(IV)四(二甲胺基)铪(IV)
IUPAC name
dimethyl[tris(dimethylamino)hafnio]amine
Properties
Safety Information
GHS Pictograms
Corrosive to metals, category 1
Skin corrosion, categories 1A,1B,1C
Serious eye damage, category 1
Flammable gases, category 1
Flammable aerosols, categories 1,2
Flammable liquids, categories 1,2,3
Self-reactive substances and mixtures, Types B,C,D,E,F
Pyrophoric liquids, category 1
Pyrophoric solids, category 1
Self-heating substances and mixtures
Substances and mixtures, which in contact with water, emit flammable gases, categories 1,2,3
Organic peroxides, Types B,C,D,E,F
RID/ADR
UN 3396 4.3/PG 2
UN Number
3396
GHS Signal Word
Danger
GHS Hazard statements
H228-H261-H314
German water hazard class
3
Risk Statements
11-14-34
Hazard Class
4.3
Packing Group
2
GHS Precautionary statements
P210-P231+P232-P280-P305+P351+P338-P310-P422
European Hazard Symbols
Flammable (F)
Corrosive (C)MSDS Link
Personal Protective Equipment
Eyeshields, Faceshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
Safety Statements
6-26-36/37/39-43-45
Supplemental Hazard Statements
Reacts violently with water.
Physical Property
Apperance
low-melting solid
Melting Point
26-29 °C(lit.)
Density
1.098 g/mL at 25 °C
Flash Point
109.4 °F
43 °C
Product Information
Linear Formula
[(CH3)2N]4Hf
Molecule Details
Frequently Asked Questions
Live Chat and Frequently Asked Questions are available for this Product.
Application
Precursor to HfO2 by atomic layer deposition with water.1
General description
Atomic number of base material: 72 Hafnium
Packaging
25 g in ss cylinder
Protocols & Applications
Precursors Packaged for Depositions Systems
Live Chat and Frequently Asked Questions are available for this Product.
Application
Precursor to HfO2 by atomic layer deposition with water.1
General description
Atomic number of base material: 72 Hafnium
Packaging
25 g in ss cylinder
Protocols & Applications
Precursors Packaged for Depositions Systems
Molecular Spectra
No Data Available
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References
No Data Available
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