Application Precursor to boron carbide thin films by chemical vapor deposition (CVD).1 Trimethylboron is used as an organometallic precursor for the CVD of boron-carbon containing films and as a boron source in the deposition of borophosphosilicate glass (BPSG). Packaging 10 g in ss cylinder Recommended products Stainless steel regulators Z527416 or Z527424 are recommended.